Journal
APPLIED PHYSICS LETTERS
Volume 85, Issue 7, Pages 1244-1246Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1781352
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This letter reports low-pressure, room-temperature growth of carbon nanofibers containing nitrogen by plasma chemical vapor deposition arrangement. By alternating pure acetylene plasma and afterglow pure nitrogen high dense plasma, a fine control of the fibers growth kinetic is obtained. This layer-by-layer deposition technique takes advantage of nitrogen chemical etching effects during the growth of nitrogen-doped carbon nanofibers. (C) 2004 American Institute of Physics.
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