4.4 Article

Thick tellurium electrodeposition on nickel-coated copper substrate for 124I production

Journal

APPLIED RADIATION AND ISOTOPES
Volume 66, Issue 10, Pages 1281-1286

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.apradiso.2008.02.082

Keywords

thick electrodeposition; tellurium target; I-124; production; TeO2

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Tellurium electrodeposition on a nickel-coated copper substrate was investigated for production of iodine-124. The electrodeposition experiments were carried out by the alkali plating baths. The optimum conditions of the electrodeposition of tellurium were as follows: 6g l(-1) tellurium, pH = 10, DC current density of ca. 8.55mA cm(-2) and room temperature. (c) 2008 Elsevier Ltd. All rights reserved.

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