4.6 Article

Hydrothermal epitaxial growth and nonvolatile bipolar resistive switching behavior of LaFeO3-PbTiO3 films on Nb:SrTiO3(001) substrate

Journal

APPLIED PHYSICS LETTERS
Volume 105, Issue 15, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4898337

Keywords

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Funding

  1. National Basic Research Program of China [2012CB933101]
  2. National Natural Science Foundation of China [11274147, 51371093, 11034004]
  3. PCSIRT [IRT1251]
  4. Fundamental Research Funds for the Central Universities [lzujbky-2013-ct01, lzujbky-2014-174, lzujbky-2014-233]

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Epitaxial LaFeO3-PbTiO3 (LFPTO) thin films were hydrothermally grown on the Nb-SrTiO3 (100) (NSTO) substrates with a thickness about 250 nm. As fabricated Pt/LFPTO/NSTO/Pt devices exhibit reversible bipolar resistive switching behavior. The resistance ratios between high resistance state and low resistance state exceed three orders of magnitude, which can be maintained over 6 h without observable degradation. It indicates that the Pt/LFPTO/NSTO/Pt devices reveal excellent data retention and endurance characteristics. The resistive switching mechanism of the device could be attributed to the trap-controlled space-charge-limited current conduction which is controlled by the localized oxygen vacancies in the films. Furthermore, variation of Pt/LFPTO Schottky junction depletion thickness and barriers height modulated by oxygen vacancies at Pt/LFPTO interface was suggested to be responsible for the resistance switching behaviors of the devices. (C) 2014 AIP Publishing LLC.

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