4.6 Article

Parallel nanostructuring of GeSbTe film with particle mask

Journal

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 79, Issue 4-6, Pages 1603-1606

Publisher

SPRINGER HEIDELBERG
DOI: 10.1007/s00339-004-2860-2

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Parallel nanostructuring of a GeSbTe film may significantly improve the recording performance in data storage. In this paper, a method that permits direct and massively parallel nanopatterning of the substrate surface by laser irradiation is investigated. Polystyrene spherical particles were deposited on the surface in a monolayer array by self-assembly. The array was then irradiated with a 248-nm KrF laser. A sub-micron nanodent array can be obtained after single-pulse irradiation. These nanodents change their shapes at different laser energies. The optical near-field distribution around the particles was calculated according to the exact solution of the light-scattering problem. The influence of the presence of the substrate on the optical near field was also studied. The mechanisms for the generation of the nanodent structures are discussed.

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