4.6 Article

Optimum surface condition for plasmonic Ag nanoparticles in polycrystalline silicon thin film solar cells

Journal

APPLIED PHYSICS LETTERS
Volume 104, Issue 3, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4862978

Keywords

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Funding

  1. Korea Evaluation Institute of Industrial Technology (KEIT)
  2. Ministry Of Trade, Industry & Energy (MOTIE), Republic of Korea [10044920]
  3. Korea Evaluation Institute of Industrial Technology (KEIT) [10044920] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Excitation of surface plasmons in silver nanoparticles is a promising method for increasing the light absorption in solar cells and hence, the cell photocurrent. The optical environment is an important key factor to consider when designing plasmonic solar cells because it affects the surface plasmon characteristics. In this paper, we applied the silver nanoparticles on the rear side of polycrystalline silicon thin film solar cells and systematically investigated the optimum surface condition for maximising plasmonic enhanced light absorption in the cells. Three different environments, thermal silicon dioxide (SiO2), native SiO2, and oxide-free silicon surface were investigated. We found that the existence of the SiO2 layer between Si and nanoparticles has a major effect on Q(scat) and therefore, the absorption in the cells. We also found that nanoparticles on the thermal SiO2 layer showed that the peak of Q(scat) is located at the visible light wavelengths <700 nm, nanoparticles on the native SiO2 layer and directly on Si sample showed that their peaks of Q(scat) are positioned at the longer wavelengths >700 nm. The sample with nanoparticles on the native SiO2 layer showed the highest potential short circuit current density (J(sc)) enhancement, 62.5%, and absolute J(sc) enhancement, 32.3%. On the other hand, the sample with nanoparticles on the thermal SiO2 layer indicated 19.6% enhancement of J(sc). (C) 2014 AIP Publishing LLC.

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