Journal
PLASMA PROCESSES AND POLYMERS
Volume 1, Issue 2, Pages 164-170Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.200400021
Keywords
continuous discharges; fluorinated coatings; modulated discharges; morphology; nanostructures
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Continuous and modulated C-C4F8 (perfluorocyclobutane) plasmas were used to deposit thin Teflon-like films. Gas phase and film composition and structure were investigated and the results can be rationalized with the deposition mechanism developed in a previous work for C2F4-modulated plasmas. The effect of modulation on the morphology and the chemistry of the surface were studied.
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