4.6 Article

Growth and properties of GaSbBi alloys

Journal

APPLIED PHYSICS LETTERS
Volume 103, Issue 14, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4824077

Keywords

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Funding

  1. University of Liverpool
  2. Engineering and Physical Sciences Research Council (EPSRC) [EP/G004447/2, EP/H021388/1]
  3. Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division, of the U.S. Department of Energy [DE-AC02-05CH11231]
  4. EPSRC [EP/K000136/1, EP/K000144/1, EP/F067496]
  5. Ramsay Memorial Trust
  6. UCL
  7. Engineering and Physical Sciences Research Council [EP/K000136/1, EP/K000144/1, EP/F067496/1, EP/G004447/2, 1231178, EP/H021388/1] Funding Source: researchfish
  8. EPSRC [EP/K000136/1, EP/G004447/2, EP/H021388/1, EP/K000144/1, EP/F067496/1] Funding Source: UKRI

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Molecular-beam epitaxy has been used to grow GaSb1-xBix alloys with x up to 0.05. The Bi content, lattice expansion, and film thickness were determined by Rutherford backscattering and x-ray diffraction, which also indicate high crystallinity and that >98% of the Bi atoms are substitutional. The observed Bi-induced lattice dilation is consistent with density functional theory calculations. Optical absorption measurements and valence band anticrossing modeling indicate that the room temperature band gap varies from 720 meV for GaSb to 540 meV for GaSb0.95Bi0.05, corresponding to a reduction of 36 meV/% Bi or 210 meV per 0.01 angstrom change in lattice constant. (C) 2013 AIP Publishing LLC.

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