Journal
APPLIED PHYSICS LETTERS
Volume 102, Issue 10, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.4795860
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Funding
- National Science Foundation [DMR 10-05715, CHE 07-50422]
- U.S. Department of Energy [DEFG02-07ER46453, DEFG02-07ER46471]
- Direct For Mathematical & Physical Scien
- Division Of Chemistry [1112360] Funding Source: National Science Foundation
- Direct For Mathematical & Physical Scien
- Division Of Materials Research [1005715] Funding Source: National Science Foundation
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Pure, dense, and stoichiometric MgO thin films have been deposited at temperatures as low as 225 degrees C by chemical vapor deposition using a recently reported magnesium precursor, magnesium N,N-dimethylaminodiboranate, which has the highest room-temperature vapor pressure among known Mg-containing compounds, with water as a co-reactant. The films are characterized by x-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, and spectroscopic ellipsometry. Conformal coating on a trench with 35: 1 aspect ratio is achieved at a film growth rate of 2 nm/min. The growth rate can be tuned between 2-20 nm/min according to the requirement of the structure to be coated. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4795860]
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