4.6 Article

Growth mechanism of atomic layer deposition of zinc oxide: A density functional theory approach

Journal

APPLIED PHYSICS LETTERS
Volume 103, Issue 25, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4852655

Keywords

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Funding

  1. Alberta Innovates-Technology Futures
  2. University of Alberta
  3. Canadian Foundation for Innovation LOI fund
  4. Natural Sciences and Engineering Research Council of Canada Discovery Grants

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Atomic layer deposition of zinc oxide (ZnO) using diethylzinc (DEZ) and water is studied using density functional theory. The reaction pathways between the precursors and ZnO surface sites are discussed. Both reactions proceed by the formation of intermediate complexes on the surface. The Gibbs free energy of the formation of these complexes is positive at temperatures above similar to 120 degrees C and similar to 200 degrees C for DEZ and water half-reactions, respectively. Spectroscopic ellipsometry results show that the growth per cycle changes at approximately the same temperatures. (C) 2013 AIP Publishing LLC.

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