Journal
APPLIED PHYSICS LETTERS
Volume 103, Issue 3, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.4816036
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Funding
- German Research Foundation (DFG) within the framework of the Collaborative Research Center [SFB Transregio 24, SFB 855]
- program COST CZ (COST Action) [LD 11032, FA 264 0904]
- MEYS of Czech Republic
- [GACR 13-09853S]
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Using reactive DC sputtering in a gas aggregation cluster source, we show that pulsed discharge gives rise to a huge increase in deposition rate of nanoparticles by more than one order of magnitude compared to continuous operation. We suggest that this effect is caused by an equilibrium between slight target oxidation (during time-off) and subsequent sputtering of Ti oxides (sub-oxides) at time-on with high power impulse. (C) 2013 AIP Publishing LLC.
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