Journal
APPLIED PHYSICS LETTERS
Volume 102, Issue 8, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.4793752
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Funding
- National Key Basic Research Program of China (973 Program) [2012CB326400, 2012CB326406]
- Special Development Program of Central Financial Support to Local Universities [2011-183]
- EU [247644, 269219]
- International Science and Technology Cooperation Program of China [2012DFA11070]
- National Natural Science Foundation Program of China [60940035, 61176002]
- Doctoral Program of Higher Education of China [20112216110002]
- Jilin Provincial Science and Technology Program [201115157, 20090401, 20110704]
- Guangdong Science and Technology Program [2009B091300006, 2011B010700101]
- Science and Technology Program of Changchun City [09GH07, 11KP04]
- Program of Changchun University of Science and Technology [129666, XJJLG201101]
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This paper demonstrates that polarization plays an important role in the formation of interference patterns, pattern contrasts, and periods in four-beam interference lithography. Three different polarization modes are presented to study the effects of polarization on four-beam laser interference based on theoretical analysis, simulations, and experiments. A four-beam laser interference system was set up to modify the silicon surface. It was found that the secondary periodicity or modulation was the result of the misaligned or unequal incident angles only in the case of the TE-TE-TM-TM mode. The resulting patterns have shown a good correspondence with the theoretical analysis and simulations. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4793752]
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