Journal
APPLIED PHYSICS LETTERS
Volume 101, Issue 3, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.4737412
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Funding
- AFOSR Small Business Technology Transfer (STTR) [FA9550-11-C-0014]
- AFOSR Multi Disciplinary University Research Initiative (MURI) [FA9550-08-1-0394]
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We demonstrate a through-etched grating coupler based on subwavelength nanostructure. The grating consists of arrays of 80 nm x 343 nm rectangular air holes, which can be patterned in a single lithography/etch. A peak coupling efficiency of 59% at 1551.6 nm and a 3 dB bandwidth of 60 nm are achieved utilizing the silicon-on-insulator platform with a 1 mu m thick buried-oxide layer for transverse electric mode. The performance is comparable to gratings requiring much more complicated fabrication processes. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4737412]
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