Journal
JOURNAL OF APPLIED PHYSICS
Volume 96, Issue 7, Pages 3845-3847Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1787911
Keywords
-
Categories
Ask authors/readers for more resources
1/f noise in AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors has been measured at 300 K in strong magnetic fields up to 10 T. The devices exhibited strong geometric magnetoresistance. The magnetic-field dependence of the 1/f noise shows that fluctuations of the number of electrons is the dominant mechanism of the 1/f noise. (C) 2004 American Institute of Physics.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available