4.6 Article

1/f noise in GaN/AlGaN heterostructure field-effect transistors in high magnetic fields at 300 K

Journal

JOURNAL OF APPLIED PHYSICS
Volume 96, Issue 7, Pages 3845-3847

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.1787911

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1/f noise in AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors has been measured at 300 K in strong magnetic fields up to 10 T. The devices exhibited strong geometric magnetoresistance. The magnetic-field dependence of the 1/f noise shows that fluctuations of the number of electrons is the dominant mechanism of the 1/f noise. (C) 2004 American Institute of Physics.

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