Journal
APPLIED PHYSICS LETTERS
Volume 101, Issue 5, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.4739521
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Funding
- National Science Foundation (Division of Materials Research) [DMR-0907024]
- National Nuclear Security Administration of the U.S. Department of Energy [DE-AC52-06NA25396]
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [0907024] Funding Source: National Science Foundation
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Micropillar compression testing with repeated jumps in strain rate is used to circumvent inherent difficulties associated with nanoindentation and tensile testing of free-standing films. Application to sputtered 21 nm/21 nm Cu/Ni multilayer thin films with a cube-on-cube texture reveals an average strain rate sensitivity (m = 0.014) and activation volume (V = 17 b(3)), comparable to nanocrystalline face-centered cubic metals. Yet, m increases by similar to 50% and V decreases by 70% with increasing strain, opposite to trends reported for nanotwinned Cu. The large, strain-dependent shifts in m and V are dependent on the underlying misfit dislocation structure of Cu/Ni interfaces. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4739521]
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