Related references
Note: Only part of the references are listed.Pattern Dependency and Loading Effect of Pure-Boron-Layer Chemical-Vapor Deposition
V. Mohammadi et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2012)
High Effective Gummel Number of CVD Boron Layers in Ultrashallow p(+)n Diode Configurations
Francesco Sarubbi et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2010)
Chemical Vapor Deposition of α-Boron Layers on Silicon for Controlled Nanometer-Deep p + n Junction Formation
Francesco Sarubbi et al.
JOURNAL OF ELECTRONIC MATERIALS (2010)
Modeling studies of the chemical vapor deposition of boron films from B2H6
Daniel R. Lamborn et al.
JOURNAL OF CRYSTAL GROWTH (2007)
Catalyst deactivation in diborane decomposition
M Söderlund et al.
CATALYSIS LETTERS (2005)
Structures of the main precursors and initial decomposition products of diborane chemical vapor deposition: an experimental and ab initio molecular orbital study
K Sato et al.
CHEMICAL PHYSICS LETTERS (2000)
A chemical mechanism for in situ boron doping during silicon chemical vapor deposition
I Lengyel et al.
THIN SOLID FILMS (2000)
Share Paper
