Journal
NANOTECHNOLOGY
Volume 15, Issue 10, Pages S562-S565Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/15/10/011
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A novel self-aligned 'soft masking' method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultrafine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.
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