Journal
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
Volume 384, Issue 1-2, Pages 102-116Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.msea.2004.05.046
Keywords
superhard nanocomposites; TiN/Si3N4; reactive sputtering; plasma CVD; impurities; self-hardening
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Based on our generic concept for the design of superhard (H-vickers greater than or equal to 40 GPa) nanocomposites with a high thermal stability and oxidation resistance we discuss the role of nitrogen pressure and substrate temperature during the deposition and the detrimental effect of impurities on the formation of superhard nanocomposites with a high thermal stability. It is shown that inappropriate choice of the deposition parameters or impurities in the coatings are the possible reason of the poor reproducibility of our results by some authors. In order to differentiate between the superhard nanocomposites in which the superhardness originates from a stable nanostructure and ordinary coatings in which the hardness enhancement is due to energetic ion bombardment during their deposition we discuss the different behavior of such coatings and our nc-TiN/a-Si3N4 superhard nanocomposites upon annealing. It is further shown that hydrogen and oxygen impurities degrade the hardness. If the oxygen content in the coatings amounts to about 0.5 at.% or more, the hardness remains limited to 35 GPa or less. (C) 2004 Published by Elsevier B.V.
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