4.6 Article

Transport properties of graphene nanoribbon transistors on chemical-vapor-deposition grown wafer-scale graphene

Journal

APPLIED PHYSICS LETTERS
Volume 100, Issue 20, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4716983

Keywords

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Funding

  1. Semiconductor Research Corporation (SRC)
  2. Nanoelectronics Research Initiative (NRI)
  3. National Institute of Standards and Technology (NIST) through the Midwest Institute for Nanoelectronics Discovery (MIND)
  4. Office of Naval Research (ONR)
  5. National Science Foundation (NSF)
  6. Directorate For Engineering
  7. Div Of Electrical, Commun & Cyber Sys [0802125] Funding Source: National Science Foundation
  8. Div Of Electrical, Commun & Cyber Sys
  9. Directorate For Engineering [1232191] Funding Source: National Science Foundation

Ask authors/readers for more resources

Graphene nanoribbon (GNR) field-effect transistors (FETs) with widths down to 12 nm have been fabricated by electron beam lithography using a wafer-scale chemical vapor deposition (CVD) process to form the graphene. The GNR FETs show drain-current modulation of approximately 10 at 300K, increasing to nearly 10(6) at 4K. The strong temperature dependence of the minimum current indicates the opening of a bandgap for CVD-grown GNR-FETs. The extracted bandgap is estimated to be around 0.1 eV by differential conductance methods. This work highlights the development of CVD-grown large-area graphene and demonstrates the opening of a bandgap in nanoribbon transistors. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4716983]

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