Journal
APPLIED PHYSICS LETTERS
Volume 99, Issue 23, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3666423
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- NWO
- China Scholarship Council
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We report a surface morphology study on single-shot submicron features fabricated on silicon on insulator by tightly focused femtosecond laser pulses. In the regime just below single-shot ablation threshold nano-tips are formed, whereas in the regime just above single-shot ablation threshold, a saturation in the ablation depth is found. We attribute this saturation by secondary laser absorption in the laser-induced plasma. In this regime, we find excellent agreement between the measured depths and a simple numerical model. When the laser fluence is further increased, a sharp increase in ablation depth is observed accompanied by a roughening of the ablated hole. (C) 2011 American Institute of Physics. [doi:10.1063/1.3666423]
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