Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 22, Issue 6, Pages 3242-3245Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.1808735
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A high precision alignment concept is evaluated for suitability in UV-based nanoimprint lithography. Through three consecutive alignment steps an overlay accuracy of 50 nm is obtained with ample room for further improvements. (C) 2004 American Vacuum Society.
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