4.6 Article

Resonant wideband polarizer with single silicon layer

Journal

APPLIED PHYSICS LETTERS
Volume 98, Issue 21, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3594244

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Funding

  1. United States Air Force Office of Scientific Research [FA9550-10-1-0543]

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We present the design, fabrication, and characterization of a guided-mode resonance polarizer operating in the telecommunication band. This polarizer consists of a single one-dimensional silicon grating layer and a glass substrate. The device is designed using inverse mathematical methods and fabricated by thin-film deposition, holographic-interference patterning, and etching. The fabricated polarizer has high transmittance for transverse-magnetic polarization and low transmittance for transverse-electric polarization over a similar to 200 nm wavelength range. Its experimental extinction ratio is similar to 670:1 at a central wavelength lambda(c)=1563 nm. Experimental and theoretical results are in good agreement. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3594244]

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