Journal
APPLIED PHYSICS LETTERS
Volume 99, Issue 15, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3651274
Keywords
light polarisation; lithography; optical waveguides; polaritons; surface plasmons; wavelength division multiplexing
Categories
Funding
- A*STAR SERC [0921450030, 0921540099, 0921540098]
Ask authors/readers for more resources
A subwavelength lithography method is demonstrated theoretically and experimentally through the interference of transverse electric (TE) modes in a metal-dielectric waveguide (MDW). Like surface plasmon polaritons (SPPs) on metal surfaces, the TE modes have evanescent waves leaking out of the MDW and are used to do subwavelength patterning but with larger pattern area than SPPs for their low propagation loss. The patterning resolution and depth could be optimized by modifying the thickness of the dielectric layer in the MDW. Two-dimensional subwavelength patterning using TE modes is also proposed with azimuthally polarized light exposure. (C) 2011 American Institute of Physics. [doi:10.1063/1.3651274]
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available