Journal
APPLIED PHYSICS LETTERS
Volume 98, Issue 21, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3593491
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Funding
- Academy of Finland
- Emil Aaltonen Foundation
- Technology Industries of Finland Centennial Foundation
- Australian National Fabrication Facility
- Australian Research Council Centre of Excellence for Quantum Computation and Communication Technology [CE110001029]
- U.S. National Security Agency
- U.S. Army Research Office [W911NF-08-1-0527]
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We report on single-electron shuttling experiments with a silicon metal-oxide-semiconductor quantum dot at 300 mK. Our system consists of an accumulated electron layer at the Si/SiO2 interface below an aluminum top gate with two additional barrier gates used to deplete the electron gas locally and to define a quantum dot. Directional single-electron shuttling from the source to the drain lead is achieved by applying a dc source-drain bias while driving the barrier gates with an ac voltage of frequency f(p). Current plateaus at integer levels of ef(p) are observed up to f(p) = 240 MHz operation frequencies. The observed results are explained by a sequential tunneling model, which suggests that the electron gas may be heated substantially by the ac driving voltage. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3593491]
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