Journal
APPLIED PHYSICS LETTERS
Volume 97, Issue 25, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3525166
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Funding
- European Community [FP7/2007-2013, 211821]
- OSEO
- CNRS
- Russian Foundation for Basic Research [07-08-92163]
- Russian Academy of Sciences [27]
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Heterojunctions made of hydrogenated amorphous silicon (a-Si : H) and crystalline silicon (c-Si) are examined by conducting probe atomic force microscopy. Conductive channels at both (n)a-Si:H/(p)c-Si and (p)a-Si:H/(n)c-Si interfaces are clearly revealed. These are attributed to two-dimension electron and hole gases due to strong inversion layers at the c-Si surface in agreement with previous planar conductance measurements. The presence of a hole gas in (p)a-Si:H/(n)c-Si structures implies a quite large valence band offset (E-V(c-Si)-E-V(a-Si:H) > 0.25 eV). (C) 2010 American Institute of Physics. [doi:10.1063/1.3525166]
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