4.6 Article

Terahertz emission from metal-organic chemical vapor deposition grown Fe:InGaAs using 830 nm to 1.55 μm excitation

Journal

APPLIED PHYSICS LETTERS
Volume 96, Issue 19, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3427191

Keywords

gallium arsenide; III-V semiconductors; indium compounds; iron; MOCVD; semiconductor epitaxial layers; semiconductor growth; terahertz wave generation; terahertz wave spectra

Funding

  1. EPSRC [EP/D50225X]
  2. Egyptian Government
  3. EPSRC [EP/F029543/1, EP/E048811/1, EP/D50225X/1, EP/H007881/1] Funding Source: UKRI
  4. Engineering and Physical Sciences Research Council [GR/S51417/01, EP/E048811/1, GR/S51424/01, EP/D50225X/1, EP/F029543/1, EP/H007881/1] Funding Source: researchfish

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We demonstrate the generation of broadband terahertz (THz) frequency radiation from photoconductive emitters formed from Fe-doped InGaAs (Fe:InGaAs), grown by metal-organic chemical vapor deposition, following pulsed (femtosecond) laser excitation at wavelengths ranging from 830 nm to 1.55 mu m. The Fe is incorporated epitaxially during growth, giving precise control over the doping level. Using both single-crystal ZnTe and GaP electro-optic detectors over the same wavelength range, the emission spectra from several Fe:InGaAs wafers with different Fe content were measured, with THz emission from all wafers showing bandwidths in excess of 2.0 THz. The THz output power was found to be strongly dependant on the Fe content, the thickness of the Fe:InGaAs layer, and the excitation wavelength.(C) 2010 American Institute of Physics. [doi:10.1063/1.3427191]

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