4.6 Article

Effects of active layer thickness and thermal annealing on polythiophene: Fullerene bulk heterojunction photovoltaic devices

Journal

APPLIED PHYSICS LETTERS
Volume 97, Issue 5, Pages -

Publisher

AIP Publishing
DOI: 10.1063/1.3474654

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Funding

  1. Department of Energy Office of Inertial Confinement Fusion [DE-FC52-08NA28302]
  2. New York State Energy Research and Development Authority through the Laborstory for Laser Energetics, University of Rochester

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The effect of thermal annealing on photovoltaic devices comprising poly(3-hexylthiophene):[6,6]-phenyl C-61 butyric acid methyl ester (P3HT:PCBM) with thicknesses up to 1200 nm was investigated. Without thermal annealing, the efficiency of the as-prepared devices decreased with increasing active layer thickness, reflecting largely a reduction in the short-circuit current density and an inverse photocurrent spectral response. Thermal annealing of the full devices was found to substantially recover thick-film device efficiencies while reducing the thin-film device efficiencies. The profound variations in photovoltaic characteristics were interpreted in terms of vertical phase separation in the P3HT: PCBM blend film and Li+ diffusion from the LiF/Al contact. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3474654]

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