Fabrication of two-dimensional infrared photonic crystals by deep reactive ion etching on Si wafers and their optical properties

We report the fabrication and characterization of two-dimensional silicon-based photonic crystal structures realized by deep reactive ion etching. Photonic crystals with square and triangular lattices with very high aspect ratios up to 33 have been achieved. Photonic bandgap behaviors are identified by the transmission and reflection spectra measured by using a Fourier transform infrared spectrometer. The experimental results are in good agreement with the calculated band structures. (C) 2004 Elsevier Ltd. All rights reserved.