4.6 Article

Temperature dependence of spin diffusion length in silicon by Hanle-type spin precession

Journal

APPLIED PHYSICS LETTERS
Volume 96, Issue 12, Pages -

Publisher

AIP Publishing
DOI: 10.1063/1.3367748

Keywords

electron spin polarisation; elemental semiconductors; magnetic tunnelling; magnetoelectronics; magnetoresistance; phosphorus; silicon; spin dynamics

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The Hanle-type spin precession method was carried out in association with nonlocal (NL) magnetoresistance measurement using a highly doped (5x10(19) cm(-3)) silicon (Si) channel. The spin diffusion length obtained by the Hanle-method is in good agreement with that of the gap dependence of NL signals. We have evaluated the interface and bulk channel effects separately, and it was demonstrated that the major factor of temperature dependence of NL signals originates from the spin polarization reduction at interface between the tunnel barrier and silicon.

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