Journal
APPLIED PHYSICS LETTERS
Volume 97, Issue 18, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3511737
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- Axpo Naturstrom Fond
- European Commission [211821]
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In silicon heterojunction solar cells, thin amorphous silicon layers passivate the crystalline silicon wafer surfaces. By using in situ diagnostics during plasma-enhanced chemical vapor deposition (PECVD), the authors report how the passivation quality of such layers directly relate to the plasma conditions. Good interface passivation is obtained from highly depleted silane plasmas. Based upon this finding, layers deposited in a large-area very high frequency (40.68 MHz) PECVD reactor were optimized for heterojunction solar cells, yielding aperture efficiencies up to 20.3% on 4 cm(2) cells. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3511737]
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