Journal
APPLIED PHYSICS LETTERS
Volume 96, Issue 20, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3428360
Keywords
accelerometers; elemental semiconductors; nanostructured materials; passivation; silicon; sputter etching
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Funding
- Iran National Science Foundation (INSF)
- Research Council of the University of Tehran
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Silicon nanograss and nanostructures are realized using a modified deep reactive ion etching technique on both plane and vertical surfaces of a silicon substrate. The etching process is based on a sequential passivation and etching cycle, and it can be adjusted to achieve grassless high aspect ratio features as well as grass-full surfaces. The incorporation of nanostructures onto vertically placed parallel fingers of an interdigital capacitive accelerometer increases the total capacitance from 0.45 to 30 pF. Vertical structures with features below 100 nm have been realized. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3428360]
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