Journal
APPLIED PHYSICS LETTERS
Volume 96, Issue 18, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3428433
Keywords
-
Categories
Funding
- DFG [TRR 80]
- EC [228989]
- Swiss National Sciences Foundation through the NCCR MaNEP and Division II
Ask authors/readers for more resources
Using the metal-insulator transition that takes place as a function of carrier density at the LaAlO3-SrTiO3 interface, oxide diodes have been fabricated with room-temperature breakdown voltages of up to 200 V. With applied voltage, the capacitance of the diodes changes by a factor of 150. The diodes are robust and operate at temperatures up to 270 C. (C) 2010 American Institute of Physics. [doi:10.1063/1.3428433]
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available