Correlation between stress and hardness in pulsed cathodic arc deposited titanium/vanadium nitride alloys

We use a dual source pulsed cathodic arc with centre triggering to produce alloys in the series T1-xVxN with accurately controlled composition. We show that the composition x = 0.23 produces the highest indentation hardness and hence the highest yield stress. This composition also shows the highest stress levels, which we explain in terms of its reduced flow during deposition. The microstructure of the alloys shows that they are homogeneously mixed with the rocksalt structure. At the highest vanadium contents a (200) preferred orientation develops. This work shows that the composition Ti0.77V0.23N has a substantially higher hardness than TiN and may have an application as a high performance alloy.