Journal
THIN SOLID FILMS
Volume 467, Issue 1-2, Pages 117-120Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2004.03.023
Keywords
indium zinc oxide; DC magnetron sputtering; sputtering; flat panel display
Ask authors/readers for more resources
The deposition of indium zinc oxide (IZO) thin films was carried out on glass substrate at room temperature by dc magnetron sputtering. The effects of dc power and deposition pressure were investigated with respect to physical and optical properties of films such as deposition rate, electrical properties, microstructure and transmittance. As the dc power increases, the resistivity slightly increases and the transmittance gradually decreases. For the variation of deposition pressure, the resistivity greatly increases and the transmittance is decreased with increasing deposition pressure. The observation of the IZO films by atomic force microscopy indicates that the microstructure and surface morphology of the films are responsible for the transmittance. It was demonstrated that IZO films with a resistivity of 3.8 x 10(-4) Omega cm and an optical transmission of 80-90% in the visible spectrum could be prepared without post deposition annealing. (C) 2004 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available