Journal
APPLIED PHYSICS LETTERS
Volume 94, Issue 20, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3141457
Keywords
lenses; masks; optical fabrication; photolithography
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Funding
- U. S. Department of Energy [AC02-05CH11231]
- National Science Foundation (NSF) Nanoscale Science and Engineering Center [CMMI-0751621]
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We propose that a hyperlens can be used for photolithography to generate deep subwavelength arbitrary patterns from diffraction-limited masks. Numerical simulation shows that half-pitch resolution down to 20 nm is possible from a mask with 280 nm period at working wavelength 375 nm. We also extend the hyperlens projection concept from cylindrical interfaces to arbitrary interfaces. An example of a flat interface hyperlens is numerically demonstrated for lithography purposes.
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