Journal
APPLIED PHYSICS LETTERS
Volume 94, Issue 20, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3125252
Keywords
band structure; dark conductivity; elemental semiconductors; germanium; photodiodes; plasma CVD; semiconductor heterojunctions; silicon
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Vertical incidence photodiodes were fabricated from Ge grown epitaxially on Si(100) by low-energy plasma-enhanced chemical vapor deposition. Consideration of the energy band profiles of n-i-p and p-i-n heterostructures, and optimization of growth processes and thermal budget, allowed the performance of Ge photodectors integrated on Si(100) substrates to be optimized. Record low dark current density of J(s)=4.1x10(-5) A/cm(2) and external quantum efficiency at 1550 nm of eta=32% were measured.
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