Journal
APPLIED PHYSICS LETTERS
Volume 94, Issue 19, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3133360
Keywords
alumina; atomic layer deposition; gallium arsenide; III-V semiconductors; indium compounds; MOSFET
Categories
Funding
- Intel Corporation
- Texas Advanced Research Program
- Texas Emerging Technology Fund
Ask authors/readers for more resources
We have investigated device performance for In0.7Ga0.3As and In0.53Ga0.47As metal-oxide-semiconductor transistors (MOSFETs) with and without InP barrier layer using atomic layer deposited Al2O3 gate dielectric. InP barrier layer was found to provide higher transconductance for both In0.7Ga0.3As and In0.53Ga0.47As MOSFETs, especially for In0.7Ga0.3As. In0.7Ga0.3As MOSFETs with InP barrier layer show much higher transconductance and lower subthreshold swing than other MOSFETs studied. These In0.7Ga0.3As MOSFETs exhibit high drive current of 98 mA/mm (L=20 mu m), subthreshold swing of 106 mV/decade and maximum effective channel mobility of 4402 cm(2)/V s.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available