Journal
APPLIED PHYSICS LETTERS
Volume 95, Issue 2, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3182856
Keywords
capacitors; MIM devices; silicon compounds; zirconium compounds
Categories
Funding
- Korea Ministry of Science and Technology as a 21st Century Frontier Program
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Quadratic voltage coefficient of capacitance (VCC) for ZrO2-SiO2 multilayered dielectric metal-insulator-metal capacitors depends strongly on the stacking sequence of the layered dielectrics. The quadratic VCC of an optimized SiO2/ZrO2/SiO2 stack and ZrO2/SiO2/ZrO2 stack were +42 and -1094 ppm/V-2, respectively, despite the same total SiO2 and ZrO2 dielectric thickness in the stack. The observed difference in quadratic VCC depending on dielectric stacking sequence is explained by taking into account both the interface and bulk dielectric responses to the applied voltage.
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