4.3 Article Proceedings Paper

High-efficiency heterojunction crystalline Si solar cell and optical splitting structure fabricated by applying thin-film Si technology

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 54, Issue 8, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.7567/JJAP.54.08KD15

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Funding

  1. New Energy and Industrial Technology Development Organization (NEDO) under Ministry of Economy, Trade and Industry of Japan

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Thin-film Si technology for solar cells has been developed for over 40 years. Improvements in the conversion efficiency and industrialization of thin-film Si solar cells have been realized through continuous research and development of the thin-film Si technology. The thin-film Si technology covers a wide range of fields such as fundamental understanding of the nature of thin-film Si, cell/module production, simulation, and reliability technologies. These technologies are also significant for solar cells other than the thin-film Si solar cells. Utilizing the highly developed thin-film Si solar cell technology, we have achieved similar to 24% efficiency heterojunction crystalline Si solar cells using 6-in. wafers and >26% efficiency solar cells with an optical splitting structure. These results indicate that further improvement of thin-film Si technology and its synergy with crystalline Si solar cell technology will enable further improvement of solar cells with efficiencies above 26%. (C) 2015 The Japan Society of Applied Physics

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