4.6 Article

Structural and magnetic properties of ε-Fe1-xCoxSi thin films deposited via pulsed laser deposition

Journal

APPLIED PHYSICS LETTERS
Volume 94, Issue 23, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3152766

Keywords

atomic force microscopy; cobalt compounds; ferromagnetic materials; iron compounds; magnetic hysteresis; magnetic thin films; paramagnetism; pulsed laser deposition; silicon; transmission electron microscopy; X-ray diffraction

Funding

  1. NSF MRSEC [DMR05-20020]
  2. NSF [DMR08-4376]
  3. Direct For Mathematical & Physical Scien
  4. Division Of Materials Research [0804376] Funding Source: National Science Foundation

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We report pulsed laser deposition synthesis and characterization of polycrystalline Fe1-xCoxSi thin films on Si (111). X-ray diffraction, transmission electron, and atomic force microscopies reveal films to be dense, very smooth, and single phase with a cubic B20 crystal structure. Ferromagnetism with significant magnetic hysteresis is found for all films including nominally pure FeSi films in contrast to the very weak paramagnetism of bulk FeSi. For Fe1-xCoxSi this signifies a change from helimagnetism in bulk, to ferromagnetism in thin films. These ferromagnetic thin films are promising as a magnetic-silicide/silicon system for polarized current production, manipulation, and detection.

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