Journal
APPLIED PHYSICS LETTERS
Volume 94, Issue 8, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3089698
Keywords
calcium compounds; lanthanum compounds; lattice constants; metal-insulator boundaries; niobium; ohmic contacts; pulsed laser deposition; strontium compounds; thermionic electron emission; thin films; tunnelling
Categories
Funding
- National Natural Science Foundation of China
- National Fundamental Research of China
- Chinese Academy of Sciences
Ask authors/readers for more resources
Effects of film thickness on interfacial barrier have been studied for the La0.67Ca0.33MnO3/SrTiO3:Nb and La0.67Sr0.33MnO3/SrTiO3:Nb junctions. In addition to the evolution of the transport behavior from electron tunneling to thermionic emission, increase in film thickness from similar to 5 to similar to 50 nm causes a significant growth of interfacial barrier as revealed by photoresponse experiments, and the maximum change in interfacial barrier is similar to 13% for La0.67Ca0.33MnO3/SrTiO3:Nb and similar to 45% for La0.67Sr0.33MnO3/SrTiO3:Nb. A linear relation between interfacial barrier and lattice constant of the films is further found, which suggests the influence of lattice strains on interfacial barrier. Qualitative explanations are given.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available
Share Paper
