Related references
Note: Only part of the references are listed.High capacitance density metal-insulator-metal structures based on a high-κ HfNxOy-SiO2-HfTiOy laminate stack
V. Mikhelashvili et al.
APPLIED PHYSICS LETTERS (2008)
Atomic vapor deposition of strontium tantalate films for MIM applications
Mindaugas Lukosius et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2008)
Effects of postmetallization oxygen annealing on electrical properties of 25 nm thick amorphous BaSm(2)Ti(4)O(12) film
Young Hun Jeong et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2008)
Nonlinear capacitance variations in amorphous oxide metal-insulator-metal structures
S. Blonkowski
APPLIED PHYSICS LETTERS (2007)
Experimental evidence for the role of electrodes and oxygen vacancies in voltage nonlinearities observed in high-k metal-insulator-metal capacitors
F. El Kamel et al.
APPLIED PHYSICS LETTERS (2007)
Modeling of nonlinearities in the capacitance-voltage characteristics of high-k metal-insulator-metal capacitors
P. Gonon et al.
APPLIED PHYSICS LETTERS (2007)
Improved electrical properties using SrTiO3/Y2O3 bilayer dielectrics for MIM capacitor applications
Maurice Kahn et al.
MICROELECTRONICS RELIABILITY (2007)
Electrical property improvements of yttrium oxide-based metal-insulator-metal capacitors
C. Durand et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2006)
Metallorganic chemical vapor deposition of Sr-Ta-O and Bi-Ta-O films for backend integration of high-k capacitors
L. Goux et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2006)
Electrical properties in low temperature range (5 K-300 K) of tantalum oxide dielectric MIM capacitors
E Deloffre et al.
MICROELECTRONICS RELIABILITY (2005)
dc electric-field dependence of the dielectric constant in polar dielectrics: Multipolarization mechanism model
C Ang et al.
PHYSICAL REVIEW B (2004)
Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric
SJ Kim et al.
IEEE ELECTRON DEVICE LETTERS (2004)
RF, DC, and reliability characteristics of ALD HfO2-Al2O3 laminate MIM capacitors for Si RF IC applications
SJ Ding et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2004)
PVD HfO2 for high-precision MIM capacitor applications
SJ Kim et al.
IEEE ELECTRON DEVICE LETTERS (2003)
Deposition and characterisation of SrTiO3 thin films deposited by ion beam sputtering on platinized silicon substrates
E Defay et al.
FERROELECTRICS (2003)