Journal
APPLIED PHYSICS LETTERS
Volume 92, Issue 20, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.2936307
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Self-sputtering runaway in high power impulse magnetron sputtering is closely related to the appearance of multiply charged ions. This conclusion is based on the properties of potential emission of secondary electrons and energy balance considerations. The effect is especially strong for materials whose sputtering yield is marginally greater than unity. The absolute deposition rate increases similar to Q(1/2), whereas the rate normalized to the average power decreases similar to Q(-1/2), with Q being the mean ion charge state number. (c) 2008 American Institute of Physics.
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