4.6 Article

Broadening of the plasmon resonance due to plasmon-plasmon intermode scattering in terahertz high-electron-mobility transistors

Journal

APPLIED PHYSICS LETTERS
Volume 93, Issue 26, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3055610

Keywords

gallium arsenide; high electron mobility transistors; III-V semiconductors; indium compounds; semiconductor plasma; submillimetre wave transistors; surface plasmon resonance

Funding

  1. Russian Foundation for Basic Research [06-02-16155, 08-02-92497]
  2. Russian Academy of Sciences
  3. SCOPE Program from the MIC, Japan
  4. JSPS, Japan
  5. European Union [MTKD-CT-2005-029671]

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We calculate the terahertz absorption spectrum of the high-electron-mobility transistor with a short gate and long ungated channel regions and show that the main contribution to the linewidth of the gated plasmon resonance can be attributed to the plasmon-plasmon intermode scattering. The results allow interpreting recent experimental results on resonant terahertz detection by InGaAs nanotransistors. The physics of the plasmon-plasmon intermode scattering is discussed and efficiency of this process is quantitatively compared to the other possible plasmon damping mechanisms.

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