Journal
APPLIED PHYSICS LETTERS
Volume 93, Issue 25, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3050463
Keywords
antireflection coatings; elemental semiconductors; nanostructured materials; nanotechnology; optical multilayers; refractive index; silicon; silicon compounds; solar cells
Categories
Funding
- National Science Foundation (USA),
- Sandia National Laboratories (USA),
- Department of Energy (USA)
- Crystal IS (USA), Samsung Electro-Mechanics Co. (Korea)
- Troy Research Corporation (USA)
Ask authors/readers for more resources
Design, fabrication, and characterization of a broadband, omnidirectional, graded-index antireflection (AR) coating made using nanostructured low-refractive-index (n=1.05-1.40) silica deposited by oblique-angle deposition are reported. Averaged over wavelength range from 400 to 1100 nm and 0 degrees-90 degrees angle of incidence, polished Si reflects similar to 37% of incident radiation. The reflection losses are reduced to only 5.9% by applying a three-layer graded-index AR coating to Si. Our experimental results are in excellent agreement with theoretical calculations. The AR coatings reported here can be optimized for photovoltaic cells made of any type of material.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available
Share Paper
