Related references
Note: Only part of the references are listed.Experimental evidence for the role of electrodes and oxygen vacancies in voltage nonlinearities observed in high-k metal-insulator-metal capacitors
F. El Kamel et al.
APPLIED PHYSICS LETTERS (2007)
Metal-insulator-metal capacitors' current instability improvement using dielectric stacks to prevent oxygen vacancies formation
J.-P. Manceau et al.
APPLIED PHYSICS LETTERS (2007)
Thermal leakage improvement by using a high-work-function ni electrode in high-κ TiHfO metal-insulator-metal capacitors
K. C. Chiang et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2007)
Impact of TiN post-treatment on metal insulator metal capacitor performances
A. Bajolet et al.
MICROELECTRONIC ENGINEERING (2006)
High-mobility C60 field-effect molecular-wetting controlled transistors fabricated on substrates
Kenji Itaka et al.
ADVANCED MATERIALS (2006)
Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications
CX Zhu et al.
CHEMICAL VAPOR DEPOSITION (2006)
Atomic layer deposition of Al2O3 thin films on diamond
N Kawakami et al.
DIAMOND AND RELATED MATERIALS (2005)
Electrical properties of thin rf sputtered aluminum oxide films
M Voigt et al.
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY (2004)
Selective substitution of alkali cations in mixed alkali glass by solid-state electrochemistry
K Kamada et al.
JOURNAL OF SOLID STATE CHEMISTRY (2004)
High-κ gate dielectrics:: Current status and materials properties considerations
GD Wilk et al.
JOURNAL OF APPLIED PHYSICS (2001)
Defect dominated charge transport in amorphous Ta2O5 thin films
RM Fleming et al.
JOURNAL OF APPLIED PHYSICS (2000)