4.6 Article

The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films

Journal

APPLIED PHYSICS LETTERS
Volume 93, Issue 2, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.2957034

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We report the effects of thermal annealing performed in N(2) or O(2) ambient at 1200 degrees C on the structural and optical properties of Er silicate films having different compositions (Er(2)SiO(5), Er(2)Si(2)O(7), and their mixture). We demonstrate that the chemical composition of the stoichiometric films is preserved after the thermal treatments. All different crystalline structures formed after the thermal annealing are identified. Thermal treatments in O(2) lead to a strong enhancement of the photoluminescence intensity, owing to the efficient reduction of defect density. In particular the highest optical efficiency is associated to Er ions in the alpha phase of Er(2)Si(2)O(7). (C) 2008 American Institute of Physics.

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