Journal
APPLIED PHYSICS LETTERS
Volume 93, Issue 19, Pages -Publisher
AIP Publishing
DOI: 10.1063/1.3026528
Keywords
adsorption; capacitance; dielectric losses; dielectric polarisation; ellipsometry; Fourier transform spectra; glass; infrared spectra; Kramers-Kronig relations; low-k dielectric thin films; permittivity
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Funding
- Intel Corp
- National Science Foundation [0335765]
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This study investigated the origin of dielectric loss induced by O-2 plasma on organo-silicate glass low-k dielectrics. The contributions from the polarization components to dielectric constant were delineated by analyzing the results from capacitance-voltage measurement, spectroscopic ellipsometry, and Fourier transform infrared spectroscopy together with the Kramers-Kronig dispersion relation. The dielectric loss was found to be dominated by the dipole contribution, compared with the electronic and ionic polarizations. The origin of the dipole contribution was further investigated by performing quantum chemistry calculations. The physisorbed water molecules were found to be primarily responsible for the dipole moment increase and the dielectric loss.
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