Journal
APPLIED PHYSICS LETTERS
Volume 93, Issue 18, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3020298
Keywords
aluminium compounds; annealing; atomic layer deposition; conduction bands; gallium arsenide; hafnium compounds; high-k dielectric thin films; III-V semiconductors; indium compounds; photoelectron spectra; semiconductor-insulator boundaries; surface chemistry; surface cleaning; valence bands
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Funding
- Intel
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The synchrotron radiation photoemission spectroscopic study was conducted to (a) investigate the surface chemistry of In0.53Ga0.47As and In0.52Al0.48As postchemical and thermal treatments, (b) construct band diagram, and (c) investigate the interface property of HfO2/In0.53Ga0.47As and HfO2/In0.52Al0.48As. Dilute HCl and HF etch remove native oxides on In0.53Ga0.47As and In0.52Al0.47As, whereas in situ vacuum annealing removes surface arsenic pileup. After the atomic layer deposition of HfO2, native oxides were considerably reduced compared to that in as-received epilayers, strongly suggesting the self-clean mechanism. Valence and conduction band offsets are measured to be 3.37 +/- 0.1 and 1.80 +/- 0.3 eV for In0.53Ga0.47As and 3.00 +/- 0.1 and 1.47 +/- 0.3 eV for In0.52Al0.47As, respectively.
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