Journal
ADVANCED MATERIALS
Volume 16, Issue 23-24, Pages 2166-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200400436
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The fabrication of three-dimensional silicon networks (see Figure) via a self-stabilized electrochemical etching technique onto lithographically pre-structured substrates is demonstrated. The optical characterization confirms a complete three-dimensional photonic bandgap of about 4% centered at 3 mum.
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