Journal
APPLIED PHYSICS EXPRESS
Volume 6, Issue 6, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.7567/APEX.6.066501
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Funding
- National Natural Science Foundation of China (NSFC) [91123032, 61275171, 61205194, 61275048, 51003113]
- Ministry of Science and Technology of China under Basic Science Research Program [2010CB934103]
- Ministry of Science and Technology of China under International Cooperation Program [2010DFA01180]
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We propose a method to direct writing of a shape-controlled nanodot array by two-photon nanolithography (TPNL). An elliptical nanodot with a minor axis diameter of 50 nm was realized using an AR-N 4340 photoresist by employing a slit to achieve the elliptical beam. Theoretical simulations were carried out to estimate the feature size of nanostructures. The adjustments of the ellipticity and orientation of nanodot were investigated. Furthermore, we fabricated elliptical and rectangular nanodot arrays on a large scale. This study would provide evidence for fabricating shape-varied nanodot arrays in the fields of plasmonics and photonics by the TPNL. (C) 2013 The Japan Society of Applied Physics
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